magnetron sputtering of multicomponent
Work function of transparent conducting multicomponent
Oct 10 1998 · In addition transparent conducting films consisting of multicomponent oxides composed of combinations of these binary or ternary oxides were also prepared by magnetron sputtering. The work function of these TCO films was measured
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cornerstone of present research activities 1 2 . Most of multicomponent materials are fabricated as thin films by pulsed laser or magnetron sputter deposition techniques. Magnetron sputtering provides broader possibilities for complex materials engineering due to the spatial extent of the
Get PriceRefractive index change of multicomponent glass films for
Refractive index change of multicomponent glass films for bismuthate erbium-doped waveguide amplifiers prepared by radio-frequency magnetron sputtering under different magnetic fields of cathode Junichi Kageyama Mamoru Yoshimoto b Akifumi Matsuda b Yuki Kondo Motoshi Ono a Naoki Sugimoto a Asahi Glass Co. Ltd. 1150 Hazawa-cho. Kanagawa-kit.
Get PriceMicrostructure and Mechanical Properties of Magnetron
Magnetron Sputtering of Carbon Supersaturated W FilmsA Chemical Approach to Increase Strength and Ductility in manu-script. II S. Fritze M. Hans L. Riekehr B. Osinger E. Lewin J.M. Schneider U. Jansson Influence of Carbon on Microstructure and Mechanical Properties of Magnetron Sputtered TaW Coat-ings in manuscript.
Get PriceDeposition of Thin Films by Sputtering SpringerLink
Mientus R. Ellmer K. (1999) Reactive DC Magnetron Sputtering of Elemantal Targets in Ar/N2 Mixtures Relation between the Discharge Characteristics and the Heat of Formation of Corresponding Nitrides Surf. Coat. Technol. 116–119 1093–1101. CrossRef Google Scholar
Get PriceSputtering of pure boron using a magnetron without a radio
Apr 18 2017 · Boron at room temperature is insulating and therefore conventionally sputtered using radio-frequency power supplies including their power-matching networks. In this contribution we show that through a suitable ignition assistance via temporary application of a high voltage (∼600 V) to the substrate holder or auxiliary electrode the magnetron discharge can be ignited using a conventional
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adshelp at cfa.harvard.edu The ADS is operated by the Smithsonian Astrophysical Observatory under NASA Cooperative Agreement NNX16AC86A
Get PriceFabrication of Multicomponent Carbide Coatings by Modified
Request PDF On Sep 1 2019 Vyacheslav Perekrestov and others published Fabrication of Multicomponent Carbide Coatings by Modified Magnetron Sputter Deposition
Get PriceSputtering of pure boron using a magnetron without a radio
Apr 18 2017 · Boron at room temperature is insulating and therefore conventionally sputtered using radio-frequency power supplies including their power-matching networks. In this contribution we show that through a suitable ignition assistance via temporary application of a high voltage (∼600 V) to the substrate holder or auxiliary electrode the magnetron discharge can be ignited using a conventional
Get PriceMagnetron sputtering of hard and strong multicomponent
Multicomponent carbide thin films of (HfNbTiVZr)C with varying amounts of carbon (40-50 at. ) were deposited using non-reactive DC magnetron sputtering. All carbide films exhibit a single solid solution phase with NaCl-type structure (space group Fm-3m) and a lattice parameter of approximately 4.53 Å. The hardness increases to
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Magnetron sputtering can significantly reduce the thickness of the prepared ceramic film compared to the 20 micron film prepared by conventional paint-coating.
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Feb 01 2012 · To fabricate multicomponent alloy films by magnetron sputtering it usually requires multiple targets corresponding to each constituent element for composition control .
Get PricePreparation of highly transparent and conducting Ga2O3
Multicomponent Ga2O3–In2O3films have been prepared by dc magnetron sputteringusing targets with a Ga content Ga/(In Ga) atomic ratio of 0–60 at. Transparent conducting thin films prepared with Ga contents up to about 40 at. were identified as Ga-doped In2O3(In2O3 Ga).
Get Pricep-type semiconducting Cu2O–CoO thin films prepared by
The preparation by magnetron sputtering of p-type semiconducting thin films consisting of a multicomponent oxide composed of Cu oxide and Co oxide is
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In the present work multicomponent refractory (TiNbZrTa)N x (0 ≤ x ≤ 0.83) films were deposited by reactive magnetron sputtering using two segmented targets and a nitrogen flow ratio f N = N 2/ (Ar N 2) varied between 0 and 30.8 . The effect of the nitrogen content on the microstructure electrical mechanical and corrosion
Get PriceEffect of Total Pressure on the Structure of TiCrN Thin
2016). A tactic which evolves the method of magnetron sputtering for depositing multicomponent thin films with any content of elements using a single magnetron is the use of a mosaic target (a target that consists of a matrix of one metal with inserts of other metals). The s puttering by mosaic target is suitable for deposited films
Get PriceMulticomponent TiSiBC superhard and tough composite
Multicomponent TiSiBC thin film with high hardness and modulus of 45 GPa and 520 GPa with 50 elasticovery after unloading have been synthesised by single target magnetron sputtering.
Get PriceFeatures of DC magnetron sputtering of mosaic copper
cornerstone of present research activities 1 2 . Most of multicomponent materials are fabricated as thin films by pulsed laser or magnetron sputter deposition techniques. Magnetron sputtering provides broader possibilities for complex materials engineering due to the spatial extent of the
Get PriceMagnetron sputtering of binary ternary and multicomponent
Multicomponent carbide thin films of (CrNbTaTiW)C (30–40 at. C) with different metal contents were depos-ited at different temperatures using non-reactive DC magnetron sputtering. The lattice distortion for the metallattice was estimated to vary from about 3 to 5 .
Get PriceMagnetron sputtering of binary ternary and multicomponent
Magnetron sputtering of carbon-con- taining multicomponent alloys — A pathway to hard and ductile thin films.
Get PriceMicrostructure and Mechanical Properties of Magnetron
Magnetron Sputtering of Carbon Supersaturated W FilmsA Chemical Approach to Increase Strength and Ductility in manu-script. II S. Fritze M. Hans L. Riekehr B. Osinger E. Lewin J.M. Schneider U. Jansson Influence of Carbon on Microstructure and Mechanical Properties of Magnetron Sputtered TaW Coat-ings in manuscript.
Get PriceMulticomponent TiSiBC superhard and tough composite
Multicomponent TiSiBC thin film with high hardness and modulus of 45 GPa and 520 GPa with 50 elasticovery after unloading have been synthesised by single target magnetron sputtering.
Get PriceCombinatorial deposition by r.f. magnetron sputtering
A new technique incorporating combinatorial deposition to develop new multicomponent oxide and oxynitride thin-film phosphors by r.f. magnetron sputtering is demonstrated using subdivided powder targets. By sputtering with a powder target that is subdivided into two or more parts phosphor thin films with a chemical composition that varied
Get PriceFormation and Physical Properties of Multicomponent
Multicomponent coatings were fabricated by sputtering of a rod target consisting of discs of various metals and carbon. The sputtering device used in this study has been developed by authors and represents modified dc magnetron sputtering with cathodic assembly in
Get PriceCOMPARATIVE INVESTIGATION OF CrN CrCN AND CrSiCN
with alloying elements see Ref. 22 ). Both CrN and multicomponent Cr based coatings were prepared so far by different PVD methods magnetron sputtering (MS) 6 14 or cathodic arc evaporation (CAE) 3 4 15 techniques. The goal of the present work was to comparatively investigate Cr based
Get PriceInfluence of Sputter Gas Pressure and Substrate Bias on
Teixeira V. Andritschky M. (1993) Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering. In Auciello O. Engemann J. (eds) Multicomponent and Multilayered Thin Films for Advanced Microtechnologies Techniques Fundamentals and Devices.
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